Yang Jie has enough patience for this, and in his previous life, it took more than ten years of time and technology accumulation for Acemoore to launch ultraviolet lithography products.

In fact, since 2000, while optical lithography technology has been striving to break through the "limit" of resolution, many overseas research institutions have also been developing different lithography technologies, including extreme ultraviolet lithography technology, electron beam lithography technology, X-ray lithography technology, nanoimprint technology and so on.

The main reason why X-ray lithography technology was proposed for research and development is because the wavelength of X-ray is extremely short, X-ray is usually between 0.7 and 0.12 nanometers when used for lithography, and its strong penetration determines that it can also define high-resolution patterns on thick materials.

However, there are two great difficulties in this technology at this stage, one is how to get a light source that can work stably and reliably for a long time, so far, there is no way to create a light source that meets such conditions in the world, because at this stage, human beings have made the third generation of synchrotron radiation light sources have come up with the strength to eat.

Moreover, the most important and difficult technology for using X-ray lithography is mask manufacturing technology, in which 1:1 lithography is very difficult and is one of the problems hindering the development of technology.

In the past, scientists have made great progress in it, and there are also some new materials discovered and applied, some of which have been practiced in the laboratory, but there are still no major achievements for industrial development.

The basic structure of X-ray mask includes thin film, absorber, frame and substrate, of which the thin film lining material generally uses silicon, silicon carbide and diamond, and the absorber mainly uses gold, tungsten and other materials.

It should be able to effectively transmit X-rays and other rays, and ensure that it has sufficient mechanical strength, has high X-ray absorption, and is thick enough to ensure the amount of its aspect ratio, and it must have a high degree of resolution and contrast, and the size of the mask must ensure its accuracy, and there should be no defects or fewer defects.

In addition, it is necessary to develop special photoresists, which is more difficult than the development of extreme ultraviolet photoresists by Huaxing Group.

Therefore, this technology can only be used as a pre-research, and there is no possibility of realization at this stage.

As for the nanoimprint lithography technology researched by some R&D institutions, mainly including hot imprint printing, ultraviolet imprint printing and micro-contact printing, this technical principle is the same as stamping, using high-resolution electron beam and other methods to make complex nanostructure patterns on the stamp, and then using the pre-patterned seal to deform the polymer material and form a structural pattern on the polymer.

However, this technology is also limited by the current equipment manufacturing technology and chemical material technology, and even if it is used, it requires extremely precise electron beam equipment to etch patterns on silicon carbide materials, and also to develop different polymers to be coated on wafers, and the process is not simple, and it also requires a large number of manufacturers to cooperate.

Now that lithography technology is very mature, a large number of manufacturers can benefit from this process, who would be willing to invest a lot of manpower, material and financial resources to develop these for a new process method that no one can guarantee the success of, and easily change their technical route!

Moreover, extreme ultraviolet light is the closest to practical use of a deep submicron lithography technology, because Eagle Sauce has theoretically discussed extreme ultraviolet light technology in the 80s and done many related experiments, and it is also the first country to create a third-generation radiosynchrotron light source.

It can be said that Eagle Sauce smashed many technical fields are at the forefront, but in the nineties, Eagle Sauce worked hard to develop the financial industry, a large amount of capital poured into the financial industry, and the domestic entity manufacturing industry was also greatly impacted, Eagle Sauce The only lithography machine company in China was also sold to Acemore Company, although a large number of research institutions can still get enough funds, and the military industry group company has not declined sharply because of the ability to export and manufacture arms, but because the private enterprises are bankrupt due to business difficulties, the transfer of the industry, the manufacturing capacity of the whole country is actually in a state of continuous decline。

In the past ten years, the domestic manufacturing strength of rabbits is in a state of rapid improvement, especially Huaxing Group can design and manufacture high-precision processing machinery and equipment and progress in material technology, even with the overall domestic manufacturing strength is up a big step.

It is very good to be able to build the first third-generation synchrotron radiation light source facility in China in such a short period of time, and most of the instruments and equipment can be designed and manufactured by themselves.

Yang Jie hopes that Eagle Sauce can realize his domestic problems later, and try to buy more time for the development of his company and China.

However, he also knows that the possibility of Eagle Sauce to achieve a strong manufacturing industry is not very large, unless there is a special historical opportunity or a very strong political figure comes to power and spends a lot of effort to reverse the decline, otherwise the decline of national strength is only a matter of time.

What Yang Jie wants to do now is to firmly grasp this historical opportunity, and strive to continue to invest in research and development of the core technology in his hands.

Now the development of the microelectronics industry has been hindered by many obstacles, from the development process of microelectronics technology can be analyzed and judged, if the early introduction of extreme ultraviolet lithography technology to make a comprehensive improvement to the current chip manufacturing methods, the entire chip industry will be in a precarious situation.

From the current point of view, Huaxing Group has mastered the technology of extreme ultraviolet light source and mirror group, and the next thing is how to miniaturize the light source and mirror group, although there are still many engineering and technical problems, but this is not a particularly difficult thing for Huaxing Group Company, and it can be solved within a few years.

As for the difficult engineering and technical problems of the accuracy error control of the double workpiece table within two nanometers, now because Ruixing Technology Company has made a great breakthrough in the research and development of magnetic levitation technology, and now the motion accuracy error of the workpiece table of Ruixing Technology Company is controlled between two and three nanometers, which has caught up with the technical level of Acemoore Company.

Because Rising Technology was the first to develop immersive lithography machine technology, and accumulated a large number of technical patents in this party, Acemore finally created the first immersive lithography machine this year, and it was sold very expensive, which was 10 million US dollars more than the G series lithography machine of Rising Technology.

Some wafer factories in Europe and Eagle Sauce also purchased dozens of units in order not to be pinched by Ruixing Technology Company all the time, but the sales volume of Lithography machines alone reached about 198 units last year, accounting for 65% of the market share, becoming an oligopoly company in the lithography machine market.