In the monitoring room, the operating status parameters of this set of light source facilities are displayed on the screen, and some technicians in the user control room can also be seen to be controlling the equipment from the user, while collecting and analyzing experimental data.

Yang Jie saw that the user control room that now controls the seven line station laboratories is doing experiments by different technical teams at this time, he smiled, and then said: "Let's go, go to the user control room to have a look." ”

When he came to the user control room of the biomacromolecule crystal beamline station, several people in the control room all looked at the movement in unison.

The man in his fifties who was the leader saw Yang Jie walking in surrounded by everyone, his eyes suddenly flashed with joy, and he hurriedly stepped forward with a smile.

"Yang Shao, why are you here?"

"Hehe, I heard that Professor Teng is also here, and I also came here to take a look and hear if you have any suggestions for our light source facility. ”

Yang Jie smiled and shook hands with Professor Teng in front of him.

The Professor Teng in front of him is Teng Yongkun, who studies the protein structure of viruses at the University of Science and Technology of China, and he was looking forward to the official opening of this large-scale laboratory of divine light source every day.

Because he has cooperation with a biopharmaceutical company under Huaxing Group, this time I heard about the trial operation of the large-scale laboratory of Shenguang Light Source Company, and it was also the opportunity to participate in the trial operation, so he rushed here with the technical team to do the experiment in advance.

"Yang Shao, I am very satisfied with the experimental equipment of Shenguang Light Source Co., Ltd. in the biological macromolecule crystal beamline station, today we only spent half an hour to resolve a new protein structure, and got a very beautiful set of data. ”

Professor Teng Yongkun said with a twinkle in his eyes, and then he also showed Yang Jie the data he got today, the equipment and instruments of the experimental station irradiated and photographed through different angles of light sources, and the high-performance computer in the control room could obtain images of the three-dimensional structure of biological macromolecules through software calculation.

With these images, the relationship between molecular structure and function can be revealed, and Professor Teng's detailed understanding of the three-dimensional structure of viral coat proteins can help to invent drugs that can block the infection of pathogens to cells or inhibit their pathogenic functions.

With such a powerful tool, we can understand the mechanism of cancer cells and HIV in more detail, which will be of great help to the development of anti-cancer and HIV-treated drugs.

This is also the reason why Yang Jie deliberately set aside two days for the current seven line stations to be used exclusively for life science and pharmaceutical research.

Yang Jie had a conversation with Professor Teng, and then came to a control room of a semiconductor materials subsidiary of Huaxing Group Company.

Seeing Yang Jie coming, these technicians all stood up excitedly and said hello.

"Yang Shao......"

"Don't be so restrained, I'm just here to check on the progress of your experiments. ”

Yang Jie said with a smile.

"Yang Shao, it is also thanks to the fact that we now have such a set of light source facilities to conduct experiments, otherwise our research and development progress in photoresist will be delayed for too long. ”

Dr. Huang Mingcheng, who led the technical team, said with emotion that he has been in charge of the research and development of lithography machines for nine years since he joined Huaxing Group, and this time he naturally undertook the research and development task of extreme ultraviolet photoresist.

In order to meet the higher requirements of integrated circuits for density and integration level, the photoresist for semiconductor has continuously shortened the exposure wavelength to improve the ultimate resolution, and the world's chip technology level has now entered the micro and nano level, and the wavelength of photoresist has gradually increased from ultraviolet wide spectrum to g line, i line, krypton fluoride, argon fluoride, F2, and the wavelength of F2 light source can now be done abroad at 157 nanometers, and the corresponding photoresist has been developed at the same time.

The photoresist technology department of the semiconductor materials company also started from the i-line photoresist, and after obtaining the process data through the photoresist factory set up in Luzon by Neon State, Yang Jie also found Huang Mingchao and other technicians who were making photoresist to find out the formula of i-line photoresist, and then began to independently develop photoresists for krypton fluoride and argon fluoride light sources.

However, Yang Jie did not let the photoresist of the F2 light source, but directly asked them to develop the photoresist of extreme ultraviolet light.

After several years of research and development, Huang Mingchao and other technical teams have developed extreme ultraviolet photoresist at this time, but because there is no suitable light source to do experimental verification, it will take too long to go to the national laboratory of Eagle Sauce to do experiments.

In the trial operation of the Shenguang light source facility, the technical team was the first to submit an application to the headquarters, and Yang Jie also agreed.

In order to develop an extreme ultraviolet lithography machine, there are several key subsystems to solve, the first is the extreme ultraviolet light source, and now the low-power extreme ultraviolet light source has not been developed, so many experiments can only be done in this large laboratory.

Now the Shenguang light source facility has begun trial operation, which has also laid a very solid foundation for the miniaturized extreme ultraviolet light source.

Because the power of the light source of the lithography machine is required to be 250W, and the beam energy of the Shenguang light source is higher than this, so the power of the experiment must be adjusted to the required light source power through the remote energy regulator to carry out the experiment.

In terms of photoresist, in order to achieve large-scale mass production, the irradiation response dose level of photoresist must not be higher than 20 megajoules per square centimeter, but the irradiation dose of extreme ultraviolet photoresist generally needs to reach how much per square centimeter of irradiation dose to get a perfect image must be determined after a large number of experiments, after all, the formula of photoresist is different.

Due to the destructiveness of extreme ultraviolet light, some photon random effects will be produced when irradiated, including the phenomenon of photon emission noise, and the change in the number of photons will affect the performance of the photoresist, so some imaging defects will be generated.

Moreover, the photoresist not only has the characteristics of high purity requirements and complex process, but also needs the corresponding lithography machine to be paired and debugged.

Under normal circumstances, a chip needs to go through 10 to 50 photolithography processes in the manufacturing process, due to different substrates, different resolution requirements, different etching methods, etc., different lithography processes have different specific requirements for photoresists, even if similar lithography processes, different manufacturers will have different requirements.

There are many varieties of photoresists for different applications, and these differences are mainly achieved by adjusting the formulation of photoresists.

Adjusting the formulation of photoresist to meet differentiated application needs is the core technology of photoresist manufacturers.

The photoresist technology department under the semiconductor materials company now has a team of hundreds of chemical engineers, constantly developing photoresist formulations and experimenting to meet the needs of different applications.

It can be said that Huang Mingchao's task of developing extreme ultraviolet photoresist is really very complicated, and there are many departments involved, which involve the whole body, so the research and development of Huaxing Group has always been participated by different technical departments, not alone.