Relax for the day.

Huang Mingzhe received a report from Ma Zhili on the fourth day of the Lunar New Year, and he hurried to the Materials Research Institute.

"President, you're finally here." Ma Zhili said excitedly as he walked.

Looking at the bloodshot eyes and messy hair of Ma Zhili and the others, I knew that they had been testing the model of the law of photosensitive materials these days.

"The old horse wants to combine work and rest, let's talk about it in the office!" Huang Mingzhe went to the office.

"Thank you for your concern, I'm just too excited for a while."

In the office, only Ma Zhili and the four researchers were present, and the others had not yet returned to work.

"Sit down." After Huang Mingzhe sat down: "The yield efficiency calculated by the model is about 8.6%, and the yield pass rate is about 1.7%. ”

"Yes, President." Ma Zhili said excitedly: "President, the calculation model you developed is so powerful, it is simply an artifact of material research and development. ”

"Everything in the universe is in mathematics, and nothing cannot be calculated." Huang Mingzhe said with a smile.

If someone had said this in front of Ma Zhili and the others before, they would definitely scoff at it, but now they already believe it.

"President, if this model of yours is sent out, it is estimated that it can lead to a revolution in materials science." Ma Zhili exclaimed.

Huang Mingzhe shook his head and said: "This kind of international spirit is unacceptable, we can use this model internally." ”

"The president is right."

"I've read your report, and now I'll give you the next task."

"President, please command." Ma Zhili hurriedly took out his notebook and said.

"Development of an X-ray high-sensitivity adhesive."

"X-ray highly sensitive adhesive? The president wants to develop a photoresist! Ma Zhili knew Huang Mingzhe's plan as soon as he heard it.

Huang Mingzhe nodded: "That's right, it's X-ray level photoresist, I put forward a few requirements, the wavelength is best between 3~8 nanometers; X-rays should be sensitive enough to dissolve completely within a few seconds, ideally; In addition, for the energy level of X-rays, it is best to achieve rapid photolysis without the need for high energy levels. ”

"President, if we develop an X-ray photoresist, we don't have a customer for this." Ma Zhili reminded.

At present, the light source of lithography machine on the market is generally divided into ultraviolet light (UV), deep ultraviolet light (DUV), and extreme ultraviolet light (EUV), among which the most advanced lithography machine is the extreme ultraviolet light (EUV) produced by ASML in the Netherlands, with a wavelength of 13.4 nanometers.

But in fact, in the eighties of the last century, in the lithography machine industry, in addition to the extreme ultraviolet (EUV) route, there was another route - X-ray lithography machine.

Why are X-ray lithography machines with wavelengths below 10 nanometers finally eliminated by extreme ultraviolet (EUV)?

There are two reasons, one is the efficiency problem, the lithography speed of the photoresist is relatively slow under X-ray irradiation; The second is the problem of accuracy, why is the lithography accuracy poor for X-rays with a wavelength of less than 10 nanometers? Because the mask can't be done below 10 nanometers.

The mask is the motherboard of the circuit diagram, and the reason why extreme ultraviolet light (EUV) is so accurate is that ultraviolet light can use a convex lens to reduce the light coming from the mask, and everyone knows that X-rays are very penetrating and the convex lens cannot be focused at all.

So the X-ray lithography machine was eliminated.

There are no X-ray lithography machines on the market, which means there are no customers.

"This is not a problem."

"If the president doesn't have a customer......

Huang Mingzhe interrupted Ma Zhili: "Do you know why the X-ray lithography machine was eliminated?"

Ma Zhili nodded.

"The problem of efficiency is the photosensitivity of the photoresist, and if we develop an X-ray photoresist that can be photolithography in a matter of seconds, is efficiency still an issue?" Huang Mingzhe asked rhetorically.

"Huh?" Ma Zhili was stunned.

Indeed, as Huang Mingzhe said, the problem of lithography efficiency is actually the influence of photoresist photosensitivity, and in the final analysis, it is a material problem, and the material problem is not precisely the strength of Thinking Society?

"As for the convex lens that can't focus X-rays, why don't we make a convex lens that can focus X-rays, which is also the photosensitivity of the convex lens material, and the material can change everything." Huang Mingzhe reminded with a smile.

"That's right! Why didn't I think of that?" Ma Zhili's eyes widened suddenly.

The others were also short of breath at once, and if they solved the photosensitivity of photoresist and convex lens, wouldn't it be equivalent to completing the shortcomings of X-ray lithography machines.

The innate advantages of X-ray lithography machine are low divergence, concentrated light, and short and concise wavelength.

"If we want to complete an independent lithography machine system, we can't follow the old path of Westerners step by step, otherwise we will never be able to surpass each other." Huang Mingzhe said.

This problem is actually an obstacle to the development of the domestic lithography machine industry, according to the route of Westerners, how to bypass other people's patents?

In addition, the market for lithography machines is very small, and there are so many chip manufacturing companies that come and go all over the world, and the relationship between ASML and these chip manufacturing companies is inextricably linked.

"President, we will immediately arrange the material calculation, and we will definitely win the X-ray photoresist and X-ray convex lens." Ma Zhili said firmly.

"Pay attention to rest, the body is the capital of the revolution." Huang Mingzhe said with concern.

"Thank you for your concern, I will definitely pay attention."

"Old Ma, in addition, you should pay attention to confidentiality, this thing is related to the right to speak in an industry, and you must not be sloppy." Huang Mingzhe finally reminded.

"I'll be careful." Ma Zhili's face suddenly turned grim.

……

Huang Mingzhe then called Cai Zhixing over and instructed him to prepare relevant work and acquire X-ray light source manufacturing companies, optical lens manufacturing companies and other lithography machine-related enterprises in China.

The Computer Programming Research Institute of the Thinking Club itself has very strong software strength, after all, Huang Mingzhe has independently completed the existence of the ghost of primary artificial intelligence.

The previous simulation space technology and finite element inverse analysis technology can also help the design of lithography machines.

Although the Thinking Society cannot buy ASML's extreme ultraviolet (EUV) lithography machine, the low-end lithography machine of Shanghai Zhongwei Electronics does.

Buy a low-end lithography machine back, and then use finite element inverse analysis to complete the integration of various systems of the lithography machine first, and then upgrade step by step.

February 16th.

Another subsidiary of the Thinking Society was quietly established in Shanmei City, called Shenguang Instrument Company, which was established in a very low-key manner.

Huang Mingzhe allocated 400 million yuan to his own account as an initial development fund.

In terms of materials research institutes, although there is the assistance of regular models, the research and development of materials is not so easy.

He has also been working at the Institute of Materials, and the progress of work is accelerating as the researchers of the Institute resume work one after another.

"Lao Ma, if you don't have enough personnel, you can tell Manager Cai and let him recruit more people."

"I'll sort it out in the evening and make a list of gaps." Ma Zhili admires Huang Mingzhe to the extreme.

In addition to the photosensitive material law model, Huang Mingzhe has completed the elastic material law model and the capacitive material law model these days.

These two law models have many applications for future materials science research.

Needless to say, elastic materials are capacitive materials, which are electrical energy storage materials, which are similar to batteries.

After explaining some things, Huang Mingzhe set out on the road to school.