"The Emergence of Innovative Products in the Semiconductor Industry"

ASML took the lead in developing EUV lithography machine

"Chip process may be increased tenfold"

"The chip process has reached its physical limit"

When there are still hot spots such as "magic" and "alien creatures", ASML's EUV lithography machine has immediately become a global hot spot under the operation of a group of capital behind it.

Normally, the update and iteration of a product is traceable, or there will be technical reserves.

For example, it is clear that the EUV lithography machine is a new track, which has little to do with the previous DUV lithography machine, but in the parallel world, it is only taken out after the chip reaches the 7nm bottleneck of the DUV lithography machine limit.

But here, because of the pressure brought by the Ambrera DUV lithography machine, there is also the prospect of artificial intelligence and quantum computing + supercomputing mode here.

In order to re-compete for this cutting-edge profit, for a better future.

At a time when the top chip process is still 14nm, ASML has launched their EUV lithography machine.

And because of Ambrera's influence on the lens field, there is also a sense of competition brought about by other technologies.

The EUV lithography machine that ASML came up with in advance this time is even better than the technical parameters originally planned!

A certain semiconductor company, four-star, Intel and other wafer factories have arrived and started assembly and debugging!

Obviously, ASML's EUV lithography machine is not just built, but has already been supplied, and they will be officially announced after they work overtime to complete the assembly.

In order to do it in one step, in order to reduce the reaction time for competitors!

The EUV lithography machine is much larger than the DUV, weighing 180 tons, and even the transportation requires a specialized vehicle, which is quite cumbersome to assemble.

If it weren't for the training of the staff of these cooperative fabs in advance, it would be quite normal to install and debug for more than half a year from scratch.

And now, under the pressure of Ambrera's side, both ASML and the major fabs have shown their maximum potential, and all of them are working overtime.

Under the hype fueled by various capitals, coupled with the new sanctions against Ambrera, many people have also been relieved.

This time, I'm afraid it's Ambrera!

"What a big deal!"

"I thought that the world company was already very wronged, but compared to Ambrera, it is terrible!"

"The world companies are only affected by the incident, and the main target is Ambrera, and the interests are too great for them."

"Asmarc is so insidious, he has been holding on to it, and he came out almost when the final word was finalized."

“……”

With the discussion on the Internet, when the popularity reached its peak, ASML also conducted a live broadcast.

At the same time, there are many semiconductor engineers such as a semiconductor company, four-star, Intel, etc., as well as some professionals from chip design factories and packaging factories.

Standing outside a factory, everyone has a smile on their faces.

In front of the live camera, ASML's engineers took the lead in making an introduction

"I'm afraid many people didn't expect that we would directly abandon the original mature DUV technology and develop EUV lithography machine directly from scratch."

While talking, they also walked around the factory.

"Perhaps from the very beginning, no one is optimistic about the EUV lithography machine, because although theoretically this can reach ten times the resolution of the DUV lithography machine, it is too difficult, too difficult, too many bottlenecks to be broken, the demand for technology is extremely high, and there are countless difficulties to overcome."

As he spoke, he also opened the bracelet and formed a three-dimensional holographic projection, which was briefly introduced

"Everyone knows that the essence of the lithography machine is exposure, DUV lithography machine, we can also find the corresponding lens for deep ultraviolet light to pass through, especially the new lens produced by Ambrera's technology later, which strengthens this, Ambrera's own lithography machine is to take advantage of this corner overtaking, without using the infiltration method to exceed our efficiency!"

Asmir didn't go to belittle Ambrera, and could even say that he was bragging about it.

Because only when Ambrera is strong can it be shown that they are stronger!

It was a strong opponent, but it still lost, lost in front of us!

"However, this is not possible for EUV lithography machines, the 13.5nm wavelength EUV ionization capability we use is extremely strong, and there is no lens that can fit this high-energy beam through with this kind of accuracy, so the only way to choose is reflection!"

As he spoke, the hologram was also changed, explaining the general principle.

It is to continuously use the reflection of some lenses to complete the convergence of extreme ultraviolet rays.

In total, more than a dozen reflections are required to achieve the final exposure requirement!

"This is a very high demand for the precision of the reflective lenses, thanks to Carl Zeiss's dedication in this regard."

After speaking, he made a gesture of please to the engineer next to Carl Zeiss.

The engineer of Carl Zeiss also took the opportunity to stand up and said politely

"We also used Ambrera's technical coating, but of course, we were a little bit confident in terms of accuracy......"

Subsequently, ASML representatives presented their EUV light sources.

"As mentioned before, EUV light needs to be reflected more than a dozen times to achieve our effect, and because of the ionization consumption of EUV, each reflection will lose about 30% of the energy, and in the end we can effectively use only about 2% of the light, therefore, we need the light source to have enough and stable output power, in order to overcome this problem, Cymer has spent a whole decade to overcome, but Cymer has been acquired by our company three years ago......"

As he spoke, he continued to show the holographic picture, and even the principle came out inside, that is, the liquid metal droplets were constantly bombarded with a high-energy laser, and the difficulty and accuracy of the data he provided made people's scalps tingle.

It's not hard to make, but to be stable and long-lasting, and to have a light source with enough power output, you need to make sure that every impact is extremely accurate and high enough.

Constantly bombarding dripping metal droplets, the slightest mistake in all aspects is completely different.

Later, with the continuous introduction, the audience also understood how this machine was a monster.

The beautiful light source technology, the neon light source conversion equipment, the Gallic valves, the Prussian lenses, and the Swedish bearings all need to be extremely precise and indispensable, and even the installation must be extremely delicate to avoid the slight vibration of the surrounding environment.

Even the vehicle that transports the lithography machine is a patented technology of a certain semiconductor company!

At this point in the live broadcast, many viewers can see the problem in their eyes.

EUV lithography is not a matter of two technologies, but a convergence of all the world's top technologies.

And these top giants came together to suppress Ambrera.

Or directly rely on the technical generation difference, and complete the crushing in one go!

This in itself is also a performance of showing off muscles!

Today, the mainstream chip process has only reached 14nm.

However, the theoretical limit of EUV lithography machine is that it can reach the limit of silicon-based chips, which can reach 1nm!

If you can solve the tunneling problem, it can be even lower!

Yes, this is not in line with the laws of business and profits.

There is no slow iteration of updates to harvest.

But there is no way, Ambrera is too strong to kill, their DUV lithography machine is too good, and the chip is simply in a black box state and completely incomprehensible.

In this case, you can only take out the best in one breath and knock them down directly.

Although the chip has been overdrawn to the limit, it can be made up for in quantum computing + supercomputing and artificial intelligence!

No matter how strong Ambrera artificial intelligence is, it also needs to rely on hardware!

Now, this is where ASML plays its cards.

We have the best technology in the world.

"This is our EUV lithography machine, although it has only now completed the installation and commissioning in the major wafer fabs, and then how to improve the process to the limit depends on the means of the major wafer fabs, but our tools have been made, and we already have the conditions for continuous trial and error to learn from experience, and we can continue to move forward and move forward......

"Ambrera is very strong, very strong, very strong, breathtakingly strong, and the holographic technology that I am showing now, the enhanced coating on our lenses, the structure of artificial intelligence, etc., have laid a strong foundation for Ambrera.

"But, we are stronger......"

Later, the lens was zoomed out, and ASML and many companies involved in the design of EUV parts, the three major EDA factories, the chip design factory, and all the representatives of the crystal original factory were all in the same frame.

It shows their great confidence and strength.

The reason why this live broadcast was made was to announce it to everyone.

They have the best technology in the world.

The precipitation of this kind of technology is not something you can catch up with in a short time!

You may be able to break through a certain bottleneck in the short term, but you can't break through all the bottlenecks!

When we are catching up, we will continue to move forward, always walk in front, build many barriers to block your way, so that we always maintain the gap!

Let's always occupy the maximum profit!

You are enemies of the world......

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Three more ~ first more ~ (End of chapter)